Asia PR News

HACHIOJI, Nov. 30 /PRNewswire-AsiaNet/ –

AE Also Showcasing Navigator(TM) Digital Matching Network,
Ovation(TM) Very-High Frequency Power Delivery System, Litmas(TM)
Remote Plasma Source Platform and Aera(R) EPV Exhaust Pressure
Controller

Visit AE at SEMICON Japan Hall 4, Booth #4A-606

Advanced Energy K.K. today announced that it will feature its Aera(R)
PI-980(TM) series pressure-insensitive mass flow controller (MFC) during
SEMICON Japan 2005. The company also will showcase its Navigator(TM) digital
matching network, Ovation(TM) very-high frequency (VHF) power delivery system,
Litmas(TM) RPS 1501 and 3001 remote plasma source platform and the Aera(R) EPV
exhaust pressure controller at the exposition, held December 7-9 at the
Makuhari Messe (Nippon Convention Center) in Chiba, Japan.

(Logo: http://www.newscom.com/cgi-bin/prnh/20030825/AEISLOGO )

The new Aera PI-980 series pressure-insensitive MFC delivers greater flow
stability, faster response, higher accuracy and superior real-time process
control than previous technologies or competitive products. The PI-980 series
is especially well-suited for etch, CVD, PVD and diffusion applications. The
advanced design integrates traditional thermal flow architecture with a
pressure sensor, pressure display, temperature sensor and NeuralStep(TM)
control technology, creating a single delivery package and eliminating the need
for the costly gas-panel components traditionally used to perform the same
function. Its superior gas-flow stability delivers greater
chamber-to-chamber process repeatability for improved production yields.

Also showcased this year in AE’s booth #4A-606 will be the Navigator, which
is equipped with microprocessor-controlled stepper motor circuitry and digital,
user-selectable tuning algorithms. The Navigator matching network minimizes
reflected power by automatically tuning the complex impedance of a coupled
plasma. An optional, internal Z’Scan(R) RF sensor allows real-time measurement
and analysis of process power and impendence, providing the ability to identify
and significantly reduce process variability. The Navigator digital matching
network provides advanced match technology for rapid, accurate and reliable
matching across a wide range of load impedances.

In addition, AE will feature the Ovation very-high frequency (VHF) power
delivery system. As a fully-integrated power delivery system, Ovation enables
faster, higher-precision processes, such as those required for demanding
narrow-linewidth, dielectric etch processes through implementation of a unique
power delivery scheme. It is the first to accurately deliver power into a
non-50-ohm environment without an external sensor, reacting faster than
traditional power supplies. The 60-MHz design reduces voltage potential across
the plasma sheath, minimizing ion etch damage, thus improving film quality and
yields. Its embedded measurement technology enables previously unavailable
insight into chamber plasma parameters and performance.

Also exhibited at the show will be AE’s Litmas RPS 1.5 kW and 3 kW
integrated plasma source and power-delivery systems. The Litmas RPS is
well-suited to deliver reactive gas specie fluxes for process applications
such as wafer pre-clean, photoresist strip and thin-film deposition. Its small
footprint, high performance, ease of use and low cost of ownership allow
process engineers to focus on developing critical plasma-based processes with
lower device damage, higher throughput and higher yields.

AE will also showcase the Aera EPV-100AP Exhaust Pressure Controller, a
patented technology which makes it possible to control the thickness of
tunnel-gate oxide films — even with atmospheric pressure changes, such as
weather conditions or altitude more precisely then previous technologies.

To learn more about AE’s products during SEMICON Japan, December 7-9, visit
their booth #4A-606 in hall 4 at the Makuhari Messe (Nippon Convention Center)
in Chiba, Japan. Editors interested in meeting with AE during the show may
contact Angie Kellen by phone at: (650) 968-8900 x120, or email:
akellen@mcapr.com.

About Advanced Energy
Advanced Energy is a global leader in the development and support of
technologies critical to high-technology manufacturing processes used in the
production of semiconductors, flat panel displays, data storage products, solar
cells, architectural glass and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE
creates solutions that maximize process impact, improve productivity and lower
cost of ownership for its customers. This portfolio includes a comprehensive
line of technology solutions in power, flow management, thermal instrumentation
and plasma and ion beam sources for original equipment manufacturers (OEMs) and
end-users around the world.

AE operates in regional centers in North America, Asia and Europe and
offers global sales and support through direct offices, representatives and
distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq
National Market under the symbol AEIS. More information can be found at
www.advanced-energy.com

Advanced Energy, AE, Aera, PI-980, NeuralStep, Navigator, Z’Scan, Ovation
and Litmas are trademarks of Advanced Energy Industries, Inc.

SOURCE Advanced Energy

/CONTACT: Marna Shillman, Corporate Communication Manager of Advanced
Energy Industries, Inc., +1-970-407-6280, marna.shillman@aei.com; or Angie
Kellen, Account Director of MCA, +1-650-968-8900, akellen@mcapr.com, for
Advanced Energy/
/Photo: NewsCom: http://www.newscom.com/cgi-bin/prnh/20030825/AEISLOGO
AP Archive: http://photoarchive.ap.org
PRN Photo Desk, photodesk@prnewswire.com/
/Web site: http://www.advanced-energy.com /
(AEIS)