HILLSBORO, Ore., Nov. 30 /PRNewswire-AsiaNet/ –
NanoLab 400/400S to be Introduced at SEMICON Japan
Giving Users a Complete Range of Advanced Solutions for Semiconductor Labs
FEI Company (Nasdaq: FEIC) will expand its top-of-the-line Helios
NanoLab(TM) family of DualBeams(TM) when it introduces the Helios NanoLab 400
and 400S systems next week at SEMICON Japan. Combining advanced focused ion
beam (FIB) and scanning electron microscope (SEM) technologies in a
highly-integrated and easy-to-use platform, the Helios NanoLab family of tools
will provide semiconductor manufacturers with a complete range of advanced
high-resolution solutions for their analytical labs.
The Helios NanoLab family represents the next-generation of technology
following the success of FEI’s popular Strata(TM) 400 and 400 STEM
(scanning/transmission electron microscope) in the semiconductor market. As
with all FEI products for semiconductor manufacturers, the new Helios NanoLab
systems are designed to help semiconductor companies move through their design
and process ramps quickly and with more efficiency, enabling them to move new
products to market faster.
The Helios NanoLab family features a new ultra-high resolution field
emission SEM column combined with FEI’s widely acclaimed Sidewinder(TM) FIB
column and gas chemistries to provide up to 40 percent improvement in imaging
resolution compared to previous DualBeam systems. These systems feature
greatly enhanced low-kV SEM resolution to support cross-sectional imaging and
analysis and advanced STEM applications for devices featuring new materials
and sub-65 nm design nodes. They also provide enhanced stability and optimized
operation within a wide range of parameters.
The Helios NanoLab 400 offers an advanced high resolution stage and load
lock and the 400S is equipped with a flip stage for highly precise sample
localization to bridge the SEM-TEM gap. The 600 system, introduced earlier
this year, offers a larger stage for versatile sample handling.
"From high volume 3D cross-sectional imaging and analysis to advanced
high-resolution STEM imaging, the Helios NanoLab family offers solutions to
meet the rigorous demands of semiconductor labs," said Tony Edwards, vice
president and general manager of FEI’s NanoElectronics business. "The Helios
NanoLab systems represent FEI’s continued lead in innovating combined FIB/SEM
solutions. This new DualBeam will allow users to achieve ground-breaking
results in multiple applications for advanced process nodes with accuracy and
repeatability."
FEI delivers a complete range of market-leading FIB, FIB/SEM, S/TEM and
TEM solutions designed to meet the challenges of today’s semiconductor
manufacturers. Together, the Helios NanoLab and the Titan S/TEM-the world’s
most powerful commercially-available microscope–represent a powerful and
compelling tool set for a range of applications.
About FEI
FEI is a global leader in providing innovative instruments for nanoscale
imaging, analysis and prototyping. FEI focuses on delivering solutions that
provide groundbreaking results and accelerate research, development and
manufacturing cycles for its customers in Semiconductor and Data Storage,
Academic and Industrial R&D, and Life Sciences markets. With R&D centers in
North America, Europe, and India, and sales and service operations in more
than 50 countries around the world, FEI’s Tools for Nanotech(TM) are bringing
the nanoscale within the grasp of leading researchers and manufacturers. More
information can be found online at: www.fei.com.
This news release contains forward-looking statements that include
statements about our Helios NanoLab DualBeam product line and its
capabilities. Factors that could affect these forward-looking statements
include, but are not limited to, the ongoing performance of FEI’s tools at
customer sites and failure of the tools to achieve the anticipated
performance. Please also refer to our Form 10-K, Forms 10-Q and other filings
with the U.S. Securities and Exchange Commission for additional information on
these factors and other factors that could cause actual results to differ
materially from the forward-looking statements. FEI assumes no duty to update
forward-looking statements.
SOURCE FEI Company
CONTACT: Dan Zenka, APR, Global Public Relations, FEI Company,
+1-503-726-2695
or dzenka@feico.com
Web site: http://www.feicompany.com
(FEIC)
November 30, 2006
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